Title:
PHENOLIC HYDROXYL GROUP-CONTAINING RESIN, PHOTOSENSITIVE COMPOSITION, RESIST FILM, CURABLE COMPOSITION, AND CURED PRODUCT
Document Type and Number:
WIPO Patent Application WO/2020/153048
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a phenolic hydroxyl group-containing resin having superior heat resistance and, when being used as a resist material, exhibits excellent alkali developing properties. Provided is a phenolic hydroxyl group-containing resin which is a reaction product of: an alcohol compound (X); and a novolac type phenol resin (C), of which essential reaction materials are an aliphatic aldehyde (B) and an aromatic compound (A) represented by formula (1). In formula (1): R1 and R2 each represent an aliphatic hydrocarbon group having 1-9 carbon atoms, an alkoxy group, an aryl group, an aralkyl group, or a halogen atom; m, n, and p each represent an integer of 0-4; R3 represents a hydrogen atom, an aliphatic hydrocarbon group having 1-9 carbon atoms, or a structural moiety having, on a hydrocarbon group, at least one substituent selected from alkoxy groups, halogen groups, and a hydroxyl group; and R4 represents a hydroxyl group, an aliphatic hydrocarbon group having 1-9 carbon atoms, an alkoxy group, or a halogen atom.
Inventors:
IMADA TOMOYUKI (JP)
NAGATA HIROHITO (JP)
NAGATA HIROHITO (JP)
Application Number:
PCT/JP2019/049331
Publication Date:
July 30, 2020
Filing Date:
December 17, 2019
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
C08G8/04; C08G8/28; G03F7/038
Domestic Patent References:
WO2019239784A1 | 2019-12-19 |
Foreign References:
JPH03275707A | 1991-12-06 | |||
JPH03275680A | 1991-12-06 | |||
JP2016004209A | 2016-01-12 | |||
US3928264A | 1975-12-23 |
Attorney, Agent or Firm:
OGAWA Shinji (JP)
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