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Patent Searching and Data


Title:
PHOTO-ALIGNMENT FILM FORMATION METHOD AND LIQUID CRYSTAL LAYER FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/060474
Kind Code:
A1
Abstract:
Provided are: a photo-alignment film formation method by which a photo-alignment film, that is large and can properly align a liquid crystal compound, can be formed; and a method for forming a liquid crystal layer, the method being capable of suppressing alignment defects of the liquid crystal compound in the liquid crystal layer at a large size. The photo-alignment film formation method includes an exposure step and a moving step, the exposure step and the moving step being alternately repeated to expose a photo-alignment film. In the exposure step, the surface of a photo-alignment film containing a photo-alignment material formed on a support body is irradiated with interference light formed by causing two light beams to intersect, whereby the surface of the photo-alignment film is exposed to form, on the photo-alignment film, an alignment pattern that changes the orientation of an optical axis derived from the liquid crystal compound while continuously rotating the orientation thereof along at least one in-plane direction. In the moving step, the support body is moved a distance D in a direction parallel to a straight line defined by the optical axes of the two light beams, said direction being a direction parallel to the surface of the support body. Here, the distance D is expressed by λ/{2×sin(α/2)}×N-λ/8

Inventors:
MITOBE FUMITAKE (JP)
SAITOH YUKITO (JP)
SATO HIROSHI (JP)
SASATA KATSUMI (JP)
WATANO AKIKO (JP)
Application Number:
PCT/JP2020/036297
Publication Date:
April 01, 2021
Filing Date:
September 25, 2020
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/18; G02B5/30; G02F1/1337
Domestic Patent References:
WO2019131918A12019-07-04
WO1998020391A11998-05-14
Foreign References:
JP2017062348A2017-03-30
JP2018159848A2018-10-11
JP2002198301A2002-07-12
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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