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Title:
PHOTO-FABRICATION COMPOSITION SET
Document Type and Number:
WIPO Patent Application WO/2019/230132
Kind Code:
A1
Abstract:
The present invention relates to a photo-fabrication composition set that is for use in material jet photo-fabrication and includes a model material composition and a support material composition. The model material composition includes a monofunctional monomer (A) and a polyfunctional monomer (B) that has, in the molecule thereof, a plurality of polymerizable functional groups that include a carbon-carbon double bond. The molar fractions (monofunctional monomer (A)/polyfunctional monomer (B)) of the monofunctional monomer (A) and the polyfunctional monomer (B) are 99.9/0.1–92/8. The monofunctional monomer (A) contains, relative to the total mass of the monofunctional monomer (A), at least 85 mass% of a (meth)acrylate (A1) that has a molecular weight of at least 150 but less than 400 and, as a homopolymer, has a glass transition temperature of 5°C or lower. The support material composition contains, relative to 100 parts by mass of the support material composition, 15–75 parts by mass of a polyalkylene glycol (a) that includes an oxybutylene group and has a weight average molecular weight of at least 300, 19–80 parts by mass of a water-soluble monofunctional ethylenically unsaturated monomer (b), and a photopolymerization initiator.

Inventors:
OTA HIROSHI (JP)
OKUSHIRO KEISUKE (JP)
Application Number:
PCT/JP2019/010942
Publication Date:
December 05, 2019
Filing Date:
March 15, 2019
Export Citation:
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Assignee:
MAXELL HOLDINGS LTD (JP)
International Classes:
C08L33/00; B29C64/124; B29C64/40; B33Y10/00; B33Y70/00; C08F220/00; C08L71/00
Domestic Patent References:
WO2017047692A12017-03-23
WO2016121587A12016-08-04
Foreign References:
JP2018058974A2018-04-12
JP2016163992A2016-09-08
Attorney, Agent or Firm:
YAMAO, Norihito et al. (JP)
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