Title:
PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING
Document Type and Number:
WIPO Patent Application WO/2021/070491
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a photocurable composition for nanoimprinting having excellent fine pattern formability, mold release properties, etching resistance, and application properties; and a pattern forming method using said composition. The present invention is a photocurable composition for nanoimprinting characterized by containing, as essential components, (A) an onium salt represented by general formula (1) or (2), (B) a cation-polymerizable hydrocarbon compound, and (C) an oligomer having an ethylenically unsaturated group. (1): A+[(Rf)nPF6-n]-, (2): A+BR4
- [In formula (1), each Rf independently represent an alkyl group having 1-8 carbon atoms, an alkenyl group having 2-8 carbon atoms, or an aryl group having 6-10 carbon atoms, wherein in each of the groups, 80% or more of the hydrogen atoms bound to carbon atoms are substituted with fluorine atoms, and n is an integer of 1-5. In formula (2), R represents a phenyl group in which at least one hydrogen atom is substituted with a fluorine atom or a trifluoromethyl group. A+ is a monovalent iodonium cation or sulfonium cation.]
Inventors:
NITTA SHINYA (JP)
KIZU TOMOHITO (JP)
NAKAGAWA MASARU (JP)
ITO SHUNYA (JP)
KIZU TOMOHITO (JP)
NAKAGAWA MASARU (JP)
ITO SHUNYA (JP)
Application Number:
PCT/JP2020/031938
Publication Date:
April 15, 2021
Filing Date:
August 25, 2020
Export Citation:
Assignee:
SAN APRO LTD (JP)
UNIV TOHOKU (JP)
UNIV TOHOKU (JP)
International Classes:
C08F290/00; B29C59/02; H01L21/027
Foreign References:
| JP2018056273A | 2018-04-05 | |||
| JP2014205624A | 2014-10-30 | |||
| JP2011162471A | 2011-08-25 | |||
| JP2008019292A | 2008-01-31 |
Attorney, Agent or Firm:
HAYASHI Hiroshi (JP)
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