Title:
PHOTOCURABLE-RESIN-BASED FILM PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/070715
Kind Code:
A1
Abstract:
[Problem] With respect to a method for producing a photocurable-resin-based film having a UV absorbing agent, the objective of the present invention is to suppress the occurrence of poor peeling between the photocurable-resin-based film after photocuring in said method and a base film and/or cover film. [Solution] A photocurable-resin-based film production method which involves forming, on one surface of a base film, at least one layer of a photocurable resin composition layer comprising a liquid photocurable resin composition containing UV absorbing agents and a photopolymerization initiator to obtain a layered body and then irradiating UV light onto the photocurable resin composition layer from the base film side and/or photocurable resin composition layer side of the layered body to cure the photocurable resin composition layer, said method being characterized in that at least one of the UV sources is irradiated from a light source having a light-emission peak only in the UV absorption wavelength band of the photopolymerization initiator, and λBF <λA <λBL and/or λA <λRL is satisfied, where λBF (nm) represents the transmission intermediate wavelength of the base film, λA (nm) represents the transmission intermediate wavelength for the UV absorbing agent having the largest value for the transmission intermediate wavelength among the UV absorbing agents, λBL (nm) represents the light-emission peak wavelength of the light source on the base film side, and λRL (nm) represents the light-emission peak wavelength of the light source on the photocurable resin composition layer side.
Inventors:
GOTO KEISUKE (JP)
NISHI HIDEKI (JP)
YANO TAKAHISA (JP)
NISHI HIDEKI (JP)
YANO TAKAHISA (JP)
Application Number:
PCT/JP2020/037298
Publication Date:
April 15, 2021
Filing Date:
September 30, 2020
Export Citation:
Assignee:
OKURA INDUSTRIAL CO LTD (JP)
International Classes:
B29C39/14; B29C35/08; B29C35/10; B29C41/24; B29L7/00
Foreign References:
| JP2012250516A | 2012-12-20 | |||
| JP2006306081A | 2006-11-09 | |||
| JP2007290364A | 2007-11-08 | |||
| JP2014076557A | 2014-05-01 |
Download PDF:
Previous Patent: LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT
Next Patent: SHUNT RESISTANCE MODULE
Next Patent: SHUNT RESISTANCE MODULE