Title:
PHOTOCURABLE RESIN COMPOSITION AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2019/146657
Kind Code:
A1
Abstract:
A photocurable resin composition according to the present invention contains an anionic-group-containing photosensitive resin comprising a photosensitive urethane resin, a photopolymerization initiator and a thermal curing agent, wherein the photosensitive urethane resin is produced by reacting a raw material mixture containing (A) a polyol having at least an ester bond and also having an unsaturated bond at least in the main chain thereof, (B) a compound having at least one active-hydrogen-containing group and at least one anionic group in the molecule thereof, (C) a polyisocyanate and (D) a compound having at least one active-hydrogen-containing group and an unsaturated bond group in the molecule thereof, and the photosensitive urethane resin has an ester bond and an unsaturated bond in the main chain in the same molecule, wherein at least one of a side chain and a terminal has an anionic group and a side chain has an unsaturated bond group.
Inventors:
TAI MAKOTO (JP)
GONDAIRA TAKASHI (JP)
GONDAIRA TAKASHI (JP)
Application Number:
PCT/JP2019/002126
Publication Date:
August 01, 2019
Filing Date:
January 23, 2019
Export Citation:
Assignee:
ARISAWA SEISAKUSHO KK (JP)
International Classes:
G03F7/027; B32B27/26; B32B27/40; C08G18/08; C08G18/67; C08G18/68; C09D175/04; C09D175/14; C09D201/00; C09J7/35; C09J175/04; C09J175/14; G03F7/004; H05K1/03; H05K3/28
Foreign References:
| JP2010164661A | 2010-07-29 | |||
| JP2014214186A | 2014-11-17 | |||
| JP2009230076A | 2009-10-08 | |||
| US4753860A | 1988-06-28 |
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (JP)
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