Title:
PHOTORESIST DRYING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2015/109985
Kind Code:
A1
Abstract:
A photoresist drying apparatus (100) is used for extracting a solvent in photoresist (300). The photoresist drying apparatus comprises a cavity (10), a sieve plate (40) opened with multiple sieve meshes (44) and an air extraction unit (50). The cavity comprises a top wall (12) opened with an air extraction hole (120), a bottom wall (14) opposite to the top wall and a side wall (16) that connects the top wall to the bottom wall. A glass substrate (200) coated with the photoresist is located inside the cavity. The sieve plate is accommodated inside the cavity and located between the photoresist and the top wall. The air extraction unit is located outside the cavity and is connected to the air extraction hole to extract air from the cavity through the air extraction hole.
Inventors:
XU BIN (CN)
DENG CHONG (CN)
DENG CHONG (CN)
Application Number:
PCT/CN2015/071071
Publication Date:
July 30, 2015
Filing Date:
January 20, 2015
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G03F7/38; F26B5/04; G03F7/16; G03F7/26
Foreign References:
| CN103760696A | 2014-04-30 | |||
| CN1367407A | 2002-09-04 | |||
| CN1847980A | 2006-10-18 | |||
| CN102236271A | 2011-11-09 | |||
| CN202067075U | 2011-12-07 | |||
| CN1945437A | 2007-04-11 | |||
| JP2009275924A | 2009-11-26 |
Attorney, Agent or Firm:
GUANGDONG GUANGHE LAW FIRM (CN)
广东广和律师事务所 (CN)
广东广和律师事务所 (CN)
Download PDF:
Previous Patent: CASSETTE FOR FIXING GLASS SUBSTRATE AND METHOD FOR ACCESSING GLASS SUBSTRATE
Next Patent: DISPLAY PANEL
Next Patent: DISPLAY PANEL