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Title:
PHOTORESISTS AND METHODS FOR USE THEREOF
Document Type and Number:
WIPO Patent Application WO2004092831
Kind Code:
A3
Abstract:
New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.

Inventors:
CAMERON JAMES F (US)
TREFONAS PETER (US)
BARCLAY GEORGE C (US)
Application Number:
PCT/US2004/011025
Publication Date:
June 23, 2005
Filing Date:
April 09, 2004
Export Citation:
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Assignee:
ROHM & HAAS ELECT MAT (US)
CAMERON JAMES F (US)
TREFONAS PETER (US)
BARCLAY GEORGE C (US)
International Classes:
G03C1/492; G03F7/039; G03F7/16; G03F7/40; H01L21/302; H01L21/461; (IPC1-7): G03F7/004; H01L21/302; H01L21/461
Foreign References:
US6458430B12002-10-01
US6042997A2000-03-28
US6841338B22005-01-11
US6352818B12002-03-05
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