Title:
PHOTOSENSITIVE COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT
Document Type and Number:
WIPO Patent Application WO/2023/032765
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a photosensitive composition having low dielectric properties and excellent development contrast. This problem is solved by a photosensitive composition containing a polyphenylene ether A, a polyphenylene ether B, a radically polymerizable compound, and a photoradical generator, the polyphenylene ethers A, B each being obtained from raw material phenols including a phenol satisfying a condition 1 and a phenol satisfying a condition 2, the polyphenylene ether A having a weight-average molecular weight of more than 40,000 and less than or equal to 200,000 and containing less than 20 mol% of the phenol satisfying the condition 2 relative to all of the raw material phenols, and the polyphenylene ether B containing 20 mol% or more of the phenol satisfying the condition 2 relative to all of the raw material phenols. (Condition 1) Having hydrogen atoms at the ortho and para positions (Condition 2) Having a hydrogen atom at the para position and having a functional group containing an unsaturated carbon bond
Inventors:
OKI KOTA (JP)
ISHIKAWA NOBUHIRO (JP)
ISHIKAWA NOBUHIRO (JP)
Application Number:
PCT/JP2022/031769
Publication Date:
March 09, 2023
Filing Date:
August 23, 2022
Export Citation:
Assignee:
TAIYO HOLDINGS CO LTD (JP)
International Classes:
G03F7/004; G03F7/038; H05K3/00
Domestic Patent References:
| WO2020017570A1 | 2020-01-23 |
Foreign References:
| JPS56120729A | 1981-09-22 | |||
| JP2000104014A | 2000-04-11 | |||
| JP2007166985A | 2007-07-05 |
Attorney, Agent or Firm:
ITOH, Atsushi et al. (JP)
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