Title:
PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PIXEL, METHOD FOR PRODUCING OPTICAL FILTER, METHOD FOR PRODUCING SOLID-STATE IMAGING ELEMENT, AND METHOD FOR PRODUCING IMAGE DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/161939
Kind Code:
A1
Abstract:
A photosensitive composition which contains a colorant, a resin, a polymerizable compound, a photopolymerization initiator and a solvent A, wherein: the solvent A contains a solvent A1 that has a surface tension of 28.0 mN/m or more at 25°C, a viscosity of 5.0 mP·s or less at 25°C and a boiling point of 160°C or more; and the content of the solvent A1 in the total amount of the solvent A is 15% by mass or more. A method for forming a pixel, a method for producing an optical filter, a method for producing a solid-state imaging element, and a method for producing an image display device, each method using the above-described photosensitive composition.
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Inventors:
NAKAMURA SHOICHI (JP)
Application Number:
PCT/JP2021/004476
Publication Date:
August 19, 2021
Filing Date:
February 08, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; G02B5/20; G03F7/029; G03F7/031; G03F7/20
Domestic Patent References:
| WO2018047584A1 | 2018-03-15 |
Foreign References:
| JP2009217241A | 2009-09-24 | |||
| JP2007271687A | 2007-10-18 | |||
| JP2021021887A | 2021-02-18 | |||
| JP2021015169A | 2021-02-12 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
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