PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN

WIPO Patent Application WO/2021/201288

A1

Provided are: a photosensitive element with which an improvement in resolution and the prevention of wrinkles during winding are achieved; and a method for forming a resist pattern.　The photosensitive element has, in the following order, a supporting film (A), a photosensitive resin composition layer (B), and a protective film (C), the photo-sensitive element being characterized in that the surface roughness RzA1 (nm) of the surface of the support film (A) on the side in contact with the photo-sensitive resin composition layer (B), the surface roughness RzA2 (nm) of the opposite surface thereof, the surface roughness RzC1 (nm) of the surface of the protective film (C) on the side in contact with the photo-sensitive resin composition layer, and the surface roughness RzC2 (nm) of the opposite surface thereof, satisfy the following (1)-(3). (1): 1