Title:
PHOTOSENSITIVE PARTICLES, RESIST COMPOSITION, PHOTOSENSITIVE COMPOSITION, METHOD FOR PRODUCING PHOTOSENSITIVE PARTICLES, AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/200062
Kind Code:
A1
Abstract:
The present invention provides: photosensitive particles, each of which comprises a core part and a ligand, said core part containing a crystalline metal compound; and a method for producing the photosensitive particles. The photosensitive particles have high sensitivity; and the production method enables the production of photosensitive particles that have high sensitivity. The present invention also provides: a resist composition and a photosensitive composition, each of which has high sensitivity, while being capable of reducing post-reaction and the generation of a gas; and a pattern forming method which is capable of forming a pattern with high accuracy by means of light exposure with a small irradiation quantity.
Inventors:
YAMAZAKI MASANORI (JP)
MATSUI KEISUKE (JP)
YASUNAGA TAKUYA (JP)
MATSUI KEISUKE (JP)
YASUNAGA TAKUYA (JP)
Application Number:
PCT/JP2021/010306
Publication Date:
October 07, 2021
Filing Date:
March 15, 2021
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
G03F7/004; G03F7/20
Domestic Patent References:
| WO2017163816A1 | 2017-09-28 |
Foreign References:
| JP2015157807A | 2015-09-03 | |||
| JP2019511006A | 2019-04-18 | |||
| JP2017036435A | 2017-02-16 | |||
| JP2019516120A | 2019-06-13 |
Attorney, Agent or Firm:
OHTANI PATENT OFFICE (JP)
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