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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION AND ANTIGLARE FILM
Document Type and Number:
WIPO Patent Application WO/2019/221000
Kind Code:
A1
Abstract:
The present invention relates to a photosensitive resin composition for an antiglare film, comprising (A) a multifunctional (meth)acrylate having at least three or more (meth)acryloyl groups in the molecule, (C) a photopolymerization initiator, (D) polystyrene particles, and (E) silica, and also relates to an antiglare film provided by the cure of the photosensitive resin composition.

Inventors:
TAIRA YOSHIHIKO (JP)
HASEGAWA RYO (JP)
KARINO HIROKAZU (JP)
Application Number:
PCT/JP2019/018520
Publication Date:
November 21, 2019
Filing Date:
May 09, 2019
Export Citation:
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Assignee:
POLATECHNO CO LTD (JP)
International Classes:
G02B5/02; B32B27/30; C08F2/44; C08L25/06; C08L33/08; G02B5/30; H01L27/32; H01L51/50; H05B33/02
Domestic Patent References:
WO2017141903A12017-08-24
WO2015163328A12015-10-29
WO2015145618A12015-10-01
Foreign References:
JP2009036818A2009-02-19
JP2004264327A2004-09-24
JP2009222968A2009-10-01
Attorney, Agent or Firm:
ASAMURA PATENT OFFICE, P.C. (JP)
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