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Title:
PHOTOSENSITIVE RESIN COMPOSITION, WAVELENGTH CONVERSION SUBSTRATE AND LIGHT EMITTING DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/190594
Kind Code:
A1
Abstract:
A photosensitive resin composition which contains a positive photosensitive resin having a photosensitive moiety that undergoes a cleavage reaction by means of light exposure and a wavelength conversion material that is dispersed in the photosensitive resin. The photosensitive resin and the wavelength conversion material satisfy the following requirements (i)-(iv). (i) The photosensitive moiety and the product produced in a cleavage reaction of the photosensitive resin do not undergo a neutralization reaction with the wavelength conversion material. (ii) The photosensitive moiety and the product do not cause a hydrolysis reaction of the wavelength conversion material. (iii) The HOMOs of the photosensitive moiety and the product are lower than the LUMO of the wavelength conversion material. (iv) The LUMOs of the photosensitive moiety and the product are higher than the HOMO of the wavelength conversion material. (In this connection, a combination of the photosensitive resin of chemical amplification type, the photosensitive moiety or the product of which exhibits acidity, and the wavelength conversion material which is acidic is excluded.)

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Inventors:
KAMURA MASAKAZU
IWATA AKIKO
NAKANO HIROSHI
ZHANG BAI
MATSUKIYO HIDETSUGU
AOMORI SHIGERU
Application Number:
PCT/JP2015/067002
Publication Date:
December 17, 2015
Filing Date:
June 12, 2015
Export Citation:
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Assignee:
SHARP KK (JP)
International Classes:
G03F7/039; G02B5/20; G03F7/004
Domestic Patent References:
WO2005116770A12005-12-08
Foreign References:
JPS61251652A1986-11-08
JPS60150048A1985-08-07
JPH05232703A1993-09-10
JPH024260A1990-01-09
JPS63280240A1988-11-17
JPH04120173A1992-04-21
JPS6380247A1988-04-11
JP2000012217A2000-01-14
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
Nishizawa Kazu -- pure (JP)
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