Title:
PHOTOSENSITIVE RESIN STRUCTURE FOR FLEXOGRAPHIC PRINTING PLATE, AND METHOD FOR PRODUCING FLEXOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2022/158172
Kind Code:
A1
Abstract:
This photosensitive resin structure for a flexographic printing plate comprises at least a support (a), a photosensitive resin composition layer (b) laminated on the support (a), and an infrared ablation layer (c) laminated on the photosensitive resin composition layer (b), wherein the infrared ablation layer (c) contains a resin having a predetermined structural unit (c1).
Inventors:
AKIYAMA HIROKI (JP)
MIYAMOTO SHINJI (JP)
MIYAMOTO SHINJI (JP)
Application Number:
PCT/JP2021/046025
Publication Date:
July 28, 2022
Filing Date:
December 14, 2021
Export Citation:
Assignee:
ASAHI CHEMICAL IND (JP)
International Classes:
B41C1/00; B32B7/023; B41N1/00; C08F10/00; C08F16/12; C08F20/02; C08F212/02; G03F7/00; G03F7/11; G03F7/36
Domestic Patent References:
| WO2020122001A1 | 2020-06-18 | |||
| WO2004104701A1 | 2004-12-02 |
Foreign References:
| JP2010237583A | 2010-10-21 | |||
| JP2002357907A | 2002-12-13 | |||
| JP2014119594A | 2014-06-30 | |||
| JP4080068B2 | 2008-04-23 | |||
| JP2916408B2 | 1999-07-05 | |||
| JP2016188900A | 2016-11-04 | |||
| JP2015011330A | 2015-01-19 |
Other References:
POLYMER ENGINEERING AND SCIENCE, vol. 14, 1974, pages 147 - 154
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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