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Patent Searching and Data


Title:
PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2020/246523
Kind Code:
A1
Abstract:
Provided is a plasma processing apparatus that vacuum-processes a workpiece disposed in a processing chamber using plasma, the plasma processing apparatus comprising: a container body having an opening in a wall that forms the processing chamber; a metal plate that is provided so as to block the opening and that has a slit formed so as to penetrate the thickness direction; a dielectric plate that is supported in contact with the metal plate and that blocks the slit from an exterior side of the processing chamber; and an antenna that is provided on the exterior of the processing chamber so as to oppose the metal plate, and that is connected to a high-frequency power source and causes a high-frequency magnetic field to be generated. The apparatus satisfies h – D/2 > 0.7 (where h is a distance (mm) between a center axis of the antenna and a surface of the metal plate on the antenna side, and D is a diameter (mm) of the antenna).

Inventors:
ANDO YASUNORI (JP)
Application Number:
PCT/JP2020/022017
Publication Date:
December 10, 2020
Filing Date:
June 03, 2020
Export Citation:
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Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/42; C23C16/505; H01L21/3065; H01L21/31
Foreign References:
JP2008130651A2008-06-05
JP2012253313A2012-12-20
JP2013012761A2013-01-17
JP2015092588A2015-05-14
US5619103A1997-04-08
Attorney, Agent or Firm:
NISHIMURA, Ryuhei (JP)
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