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Patent Searching and Data


Title:
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/172074
Kind Code:
A1
Abstract:
Provided is a plasma processing device comprising: a plurality of processing chambers; a manifold exhaust pipe into which a plurality of exhaust flow paths for evacuating the inside of the plurality of processing chambers converge; and a plurality of branch exhaust pipes disposed between the plurality of exhaust flow paths and the manifold exhaust pipe and connecting the plurality of exhaust flow paths and the manifold exhaust pipe. Each of the plurality of branch exhaust pipes has a mechanism, disposed in the flow path of the branch exhaust pipe, for deactivating the energy of hot electrons flowing through the flow path.

Inventors:
ISHIGAMI KATSUTOSHI (JP)
ISHIDA TAKESHI (JP)
Application Number:
PCT/JP2021/005553
Publication Date:
September 02, 2021
Filing Date:
February 15, 2021
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/3065; C23C16/44; C23C16/505; H01L21/31
Foreign References:
JP2019220509A2019-12-26
JP2005163062A2005-06-23
KR20110047085A2011-05-06
JP2018141177A2018-09-13
JPH04302143A1992-10-26
JP2003208999A2003-07-25
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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