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Patent Searching and Data


Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/172072
Kind Code:
A1
Abstract:
[Problem] Provided is prevention of erroneous discharges of electromagnetic waves having a frequency greater than or equal to the VHF band. [Solution] Provided is a plasma treatment device in which electromagnetic waves having a frequency greater than or equal to the VHF band are introduced into a treatment container, and a substrate is treated by using plasma produced from gas, said plasma treatment device having a mounting platform provided inside the treatment container and on which the substrate is mounted, an electromagnetic wave introduction unit which is formed facing an inner wall of the treatment container and introduces the electromagnetic waves into the treatment container, and a dielectric member provided to the inner wall through which the electromagnetic waves propagate, wherein a first portion of the dielectric member protrudes out from the inner wall towards the mounting platform, and a second portion of the dielectric member is inserted into a recess or stepped section of the inner wall through which the electromagnetic waves propagate.

Inventors:
IKEDA TARO (JP)
KITAHARA TOSHIFUMI (JP)
Application Number:
PCT/JP2021/005550
Publication Date:
September 02, 2021
Filing Date:
February 15, 2021
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; C23C16/44; C23C16/50; H01L21/3065; H01L21/31
Foreign References:
JP2018533192A2018-11-08
JP2012084848A2012-04-26
JP2016086099A2016-05-19
JP2002194540A2002-07-10
JPH11238597A1999-08-31
JP2004079829A2004-03-11
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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