Title:
PLASMONIC LITHOGRAPHY USING PHASE MASK
Document Type and Number:
WIPO Patent Application WO/2013/049367
Kind Code:
A3
Abstract:
In the proposed plasmonic nanolithography technique a transparent mask is brought into physical contact with a metal on a substrate that is coated with a photoresist. The mask is not made of metal or other material that supports surface plasmons. The metal layer is exposed to radiation of a characteristic vacuum wavelength through the mask and the photoresist or through the substrate. The mask features and the vacuum wavelength of the radiation are chosen so that the radiation excites surface plasmons at the interface between the metal and the photoresist. The excitation of surface plasmons allows for the exposure and generation of features which are well-below the free space diffraction limit and small compared to the size of the features in the mask.
Inventors:
KOBRIN BORIS (US)
BRONGERSMA MARK (US)
BARBARD EDWARD (US)
BRONGERSMA MARK (US)
BARBARD EDWARD (US)
Application Number:
PCT/US2012/057590
Publication Date:
May 23, 2013
Filing Date:
September 27, 2012
Export Citation:
Assignee:
ROLITH INC (US)
International Classes:
G03C1/00
Domestic Patent References:
| WO2009094009A1 | 2009-07-30 |
Foreign References:
| JPS59200419A | 1984-11-13 | |||
| US20090207398A1 | 2009-08-20 | |||
| US5043244A | 1991-08-27 | |||
| US7541115B1 | 2009-06-02 | |||
| US20030087073A1 | 2003-05-08 | |||
| US20070048628A1 | 2007-03-01 |
Attorney, Agent or Firm:
ISENBERG, Joshua D. (809 Corporate WayFremont, California, US)
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