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Patent Searching and Data


Title:
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATES, METHOD FOR PRODUCING SAME, AND METHOD FOR POLISHING SYNTHETIC QUARTZ GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/207926
Kind Code:
A1
Abstract:
The present invention is a polishing agent for synthetic quartz glass substrates, which contains polishing particles and water, and which is characterized in that: the polishing particles are composite oxide particles of cerium and yttrium; and the cerium content in the polishing particles is from 71 mol% to 79 mol% (inclusive). Consequently, the present invention is able to provide a polishing agent for synthetic quartz glass substrates, which is capable of sufficiently reducing the occurrence of defects in the surface of a synthetic quartz glass substrate due to polishing without lowering the polishing rate.

Inventors:
TAKAHASHI MITSUHITO (JP)
Application Number:
PCT/JP2019/006198
Publication Date:
October 31, 2019
Filing Date:
February 20, 2019
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C09K3/14; B24B37/00; C03C19/00
Domestic Patent References:
WO2014038536A12014-03-13
WO2017183290A12017-10-26
Foreign References:
JP2016098351A2016-05-30
JP2016092045A2016-05-23
JP2018035058A2018-03-08
JPH05151626A1993-06-18
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
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