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Patent Searching and Data


Title:
POLISHING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/180479
Kind Code:
A1
Abstract:
Provided is a polishing composition capable of effectively reducing an edge roll-off amount. A polishing composition provided by the present invention contains abrasive grains, a basic compound, a nitrogen-containing water-soluble polymer, and water. The nitrogen-containing water-soluble polymer does not include N-H bonds in molecules thereof.

Inventors:
NUMATA KEISUKE (JP)
TSUCHIYA KOHSUKE (JP)
TANIGUCHI MEGUMI (JP)
TAKEMOTO TAKAYUKI (JP)
Application Number:
PCT/JP2018/009865
Publication Date:
October 04, 2018
Filing Date:
March 14, 2018
Export Citation:
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Assignee:
FUJIMI INC (JP)
TOAGOSEI CO LTD (JP)
International Classes:
H01L21/304; B24B37/00; C09K3/14
Domestic Patent References:
WO2011135949A12011-11-03
WO2012005289A12012-01-12
Foreign References:
JP2015174918A2015-10-05
JP5007062B22012-08-22
JP2013165173A2013-08-22
JP6068647B22017-01-25
JP2017072667A2017-04-13
JP2016124943A2016-07-11
JP2014216464A2014-11-17
Other References:
See also references of EP 3605588A4
Attorney, Agent or Firm:
ABE, Makoto (JP)
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