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Patent Searching and Data


Title:
POLISHING PAD AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2021/065575
Kind Code:
A1
Abstract:
The present invention prevents detachment of an endpoint detection window from a polishing layer during polishing of an article being polished. A polishing layer 3C having an endpoint detection window 3B is manufactured in the following manner. First, a curing agent and a polymer which form the endpoint detection window are mixed, and then the mixture is poured into a mold 99 to form a columnar material 100 (FIG. 4(a)). Next, the roughness of the outer peripheral surface of the columnar material 100 is adjusted, and a plurality of projections and recesses are formed on the outer peripheral surface (FIG. 4(b)). Next, in a state where the columnar material 100 is housed in a mold frame 101, the mixture obtained by mixing the polymer and the curing agent is poured into the mold frame 101 and solidified to create a polyurethane polyurea resin molded article 102 (FIG. 4(c)). Next, the polyurethane polyurea resin molded article 102 is horizontally cut with a necessary thickness so as to form a sheet-like member 103, and the sheet-like member 103 forms a polishing layer (3C) having the endpoint detection window 3B (FIG. 4(d)).

Inventors:
MATSUOKA RYUMA (JP)
KURIHARA HIROSHI (JP)
NARUSHIMA SATSUKI (JP)
TAKAMIZAWA YAMATO (JP)
Application Number:
PCT/JP2020/035492
Publication Date:
April 08, 2021
Filing Date:
September 18, 2020
Export Citation:
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Assignee:
FUJIBO HOLDINGS INC (JP)
International Classes:
B24B37/013; B24B37/22; B24B37/26; H01L21/304
Foreign References:
JP2006110686A2006-04-27
JP2004042189A2004-02-12
Attorney, Agent or Firm:
KANZAKI Makoto et al. (JP)
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