POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER, POLISHING PAD AND METHOD FOR MODIFYING POLISHING LAYER

Title:

POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER, POLISHING PAD AND METHOD FOR MODIFYING POLISHING LAYER

Document Type and Number:

WIPO Patent Application WO/2020/095832

Kind Code:

A1

Abstract:

The present invention uses a polyurethane for polishing layers, which has a carboxylic acid ester group, and preferably uses a polyurethane which has a carboxylic acid ester group in at least one of a side chain, an end of the main chain, and the skeleton of the main chain. In addition, the present invention provides a method for modifying a polishing layer, which is characterized by comprising: a step for preparing a polishing layer which contains a polyurethane that has a carboxylic acid ester group; and a step for producing a carboxylic acid group by causing hydrolysis of the carboxylic acid ester group of the polyurethane.

Inventors:

OSHITA AZUSA (JP)
KATO MITSURU (JP)
TAKEGOSHI MINORI (JP)
OKAMOTO CHIHIRO (JP)
KATO SHINYA (JP)

Application Number:

PCT/JP2019/043003

Publication Date:

May 14, 2020

Filing Date:

November 01, 2019

Export Citation:

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Assignee:

KURARAY CO (JP)

International Classes:

C08J7/12; B24B37/24; C08G18/34; C08G18/38; C08G18/65; H01L21/304

Domestic Patent References:

WO2018021428A1	2018-02-01
WO2014084091A1	2014-06-05
WO2008029725A1	2008-03-13

Foreign References:

JP2013086217A	2013-05-13
JPH0699534B2	1994-12-07
JP2013018056A	2013-01-31
JP2005294661A	2005-10-20
JP2006036909A	2006-02-09
JPH0699534B2	1994-12-07

Other References: