PREPOLYMER HAVING TRIAZINE SKELETON, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING SAID PREPOLYMER

WIPO Patent Application WO/2020/241492

A1

A prepolymer having a triazine skeleton, which is formed by reacting a multifunctional cyanate compound and a phenol with each other. The multifunctional cyanate compound is preferably represented by formula (1) or (2). The prepolymer is especially useful as a film forming material for lithography. In the formulae, X represents an oxygen atom or the like; R2 represents a single bond or a divalent group having 0-40 carbon atoms, which may contain a heteroatom; R3 represents a trivalent group having 0-40 carbon atoms, which may contain a heteroatom; each of R0 independently represents an optionally substituted alkyl group having 0-40 carbon atoms, or the like; each m independently represents an integer of 0-9; and each p independently represents an integer of 0-3.

KOMEDA MASAHIRO (JP)
MATSUKIZONO HIROYUKI (JP)
ENDO TAKESHI (JP)
MAKINOSHIMA TAKASHI (JP)
ECHIGO MASATOSHI (JP)

PCT/JP2020/020289

December 03, 2020

May 22, 2020

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MITSUBISHI GAS CHEMICAL CO (JP)

C07D251/34; C08G73/00; C08L79/00; G03F7/023; G03F7/11; G03F7/20; H01L21/027

JP2001181388A	2001-07-03
JP2001240723A	2001-09-04

SASE, SHIGEO ET AL., JOURNAL OF NETWORK POLYMER, vol. 22, no. 4, 2001, Japan
SASE, SHIGEO ET AL., JOURNAL OF NETWORK POLYMER, vol. 22, no. 3, 2001, Japan

YAMAMOTO, Osamu et al. (JP)

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