Title:
PRESSURE CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/131577
Kind Code:
A1
Abstract:
A pressure control device 20 is provided with a pressure control valve 25, a flow resistance 23 which is provided on the downstream side of the pressure control valve to restrict the flow of gas, a first pressure sensor 21 for measuring the pressure of gas between the pressure control valve and the flow resistance, a second pressure sensor 22 for measuring the pressure of gas on the downstream side of the flow resistance, and an arithmetic control circuit 26 connected to the first pressure sensor and the second pressure sensor, wherein the configuration is such that the pressure of the gas on the downstream side of the flow resistance is controlled by adjusting the degree of opening of the pressure control valve on the basis of the output of the second pressure sensor, regardless of the output of the first pressure sensor, and the flow rate of the gas on the downstream side of the flow resistance is calculated on the basis of the output of the first pressure sensor and the output of the second pressure sensor.
Inventors:
HIRATA KAORU (JP)
NISHINO KOUJI (JP)
SUGITA KATSUYUKI (JP)
OGAWA SHINYA (JP)
IDEGUCHI KEISUKE (JP)
NISHINO KOUJI (JP)
SUGITA KATSUYUKI (JP)
OGAWA SHINYA (JP)
IDEGUCHI KEISUKE (JP)
Application Number:
PCT/JP2020/045060
Publication Date:
July 01, 2021
Filing Date:
December 03, 2020
Export Citation:
Assignee:
FUJIKIN KK (JP)
International Classes:
G05D16/20; G01L13/00; G01L19/00; H01L21/3065; H01L21/31
Domestic Patent References:
| WO2016013172A1 | 2016-01-28 | |||
| WO2008112423A1 | 2008-09-18 |
Attorney, Agent or Firm:
TANIDA Ryuichi et al. (JP)
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