Title:
PROCESSING DEVICE AND PROCESSING BASE THEREOF
Document Type and Number:
WIPO Patent Application WO/2020/010623
Kind Code:
A1
Abstract:
Disclosed in the present application are a processing device and a processing base thereof, the processing base comprising a rotation platform, a rotating assembly and a support assembly. The rotation platform is used for supporting a workpiece to be processed; the rotating assembly is rotatably connected to the rotation platform, and the rotation platform rotates around the rotating assembly as a rotation center; and the support assembly is provided at the side of the rotating assembly, and the support assembly is used for supporting the rotation platform and supporting the rotation platform to rotate at the top of the support assembly. By means of the above solution, a processing assembly is able to process any region of the surface of the workpiece to be processed, so that the problems of low processing efficiency and high processing cost caused by using a plurality of processing assemblies to process the workpiece to be processed, when the processing range of one processing assembly is insufficient, can be avoided.
Inventors:
XIE JIANHUA (CN)
Application Number:
PCT/CN2018/095660
Publication Date:
January 16, 2020
Filing Date:
July 13, 2018
Export Citation:
Assignee:
SHENZHEN A & E INTELLIGENT TECH INSTITUTE CO LTD (CN)
International Classes:
B28D7/04
Foreign References:
| CN203391135U | 2014-01-15 | |||
| CN206568351U | 2017-10-20 | |||
| CN206464786U | 2017-09-05 |
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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