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Title:
PROCESSING METHOD AND PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2020/217349
Kind Code:
A1
Abstract:
This processing method comprises: forming, on a coating layer applied onto a base material, a film transparent to visible light; and removing a portion of the film in the thickness direction thereof by irradiating the film with processing light having a wavelength absorbed by the film.

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Inventors:
SHIRAISHI MASAYUKI (JP)
KAWABE YOSHIO (JP)
Application Number:
PCT/JP2019/017467
Publication Date:
October 29, 2020
Filing Date:
April 24, 2019
Export Citation:
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Assignee:
NIKON CORP (JP)
International Classes:
B05D3/06; B05D7/24; B23K26/359
Domestic Patent References:
WO2018159591A12018-09-07
WO2018138232A22018-08-02
Foreign References:
JP2010536970A2010-12-02
JP2013043292A2013-03-04
JP2013223831A2013-10-31
JP2013222027A2013-10-28
JP2019052255A2019-04-04
JPH091917A1997-01-07
JP2007313876A2007-12-06
Attorney, Agent or Firm:
EGAMI, Tatsuo (JP)
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