Title:
PRODUCTION METHOD OF POLYACETAL RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/217752
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a production method of a polyacetal resin composition which can suppress the occurrence of formaldehyde from a molded article to an extremely low level and which stably suppresses mold deposits during molding. This method is for producing a polyacetal resin composition which contains 100 parts by mass of (A) a polyacetal polymer, 0.01-0.50 parts by mass of (B) aliphatic carboxylic acid hydrazide, 0.001-0.50 parts by mass of (C) a hydantoin compound having two hydrazinocarbonyl alkyl groups, and 0.001-0.30 parts by mass of (D) an alkaline earth metal salt of an aliphatic carboxylic acid, the total amount of (B) and (C) being 0.03-0.55 parts by mass per 100 parts by mass of (A) of the polyacetyl polymer, wherein the polyacetal polymer (A) is a polyacetal copolymer obtained by copolymerizing trioxane as the main monomer (a) and cyclic ether having at least one carbon-carbon bond as a comonomer (b) using the heteropoly acid shown in general formula (1) as the polymerization catalyst (c), and thereafter adding (d) a carbonate of an alkaline metal element or alkaline earth metal element and deactivating said polymerization catalyst (c).
Inventors:
TAMAOKA AKIHIRO (JP)
HARASHINA HATSUHIKO (JP)
MONMA TOMOHIRO (JP)
HARASHINA HATSUHIKO (JP)
MONMA TOMOHIRO (JP)
Application Number:
PCT/JP2020/010201
Publication Date:
October 29, 2020
Filing Date:
March 10, 2020
Export Citation:
Assignee:
POLYPLASTICS CO (JP)
International Classes:
C08L59/00; C08K5/09; C08K5/25; C08K5/3445
Domestic Patent References:
| WO2001005888A1 | 2001-01-25 |
Foreign References:
| JP2009286874A | 2009-12-10 | |||
| JP2013237742A | 2013-11-28 | |||
| JP2015514840A | 2015-05-21 | |||
| JP2019065233A | 2019-04-25 | |||
| JP2005162913A | 2005-06-23 | |||
| JP2006257166A | 2006-09-28 |
Attorney, Agent or Firm:
SHOBAYASHI Masayuki et al. (JP)
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