Title:
PSEUDO-SKIN FILM, METHOD FOR MANUFACTURING SAME, METHOD FOR USING SAME, AND COSMETIC KIT HAVING PSEUDO-SKIN FILM
Document Type and Number:
WIPO Patent Application WO/2020/026529
Kind Code:
A1
Abstract:
Provided is a pseudo-skin film whereby air entrapment defects during and after affixing can be overcome, and whereby a natural finish can be obtained. This pseudo-skin film has a rubber hardness of 20 or less as measured by a type A durometer in accordance with JIS K 6253, and a film thickness of 600 µm or less, through holes are disposed therein at a ratio of 3-500,000 holes/cm2, and the area of the through holes is 70-283,000 µm2/hole.
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Inventors:
TOMITA NORIKO (JP)
OBANA TAKAKAZU (JP)
OBANA TAKAKAZU (JP)
Application Number:
PCT/JP2019/015359
Publication Date:
February 06, 2020
Filing Date:
April 08, 2019
Export Citation:
Assignee:
SHISEIDO CO LTD (JP)
International Classes:
A61K8/81; A61K8/02; A61K8/87; A61K8/89; A61K8/97; A61Q1/00; A61Q1/04; A61Q3/00
Foreign References:
| JPH1023923A | 1998-01-27 | |||
| JP2011136971A | 2011-07-14 | |||
| JP2016164140A | 2016-09-08 | |||
| JP2016056173A | 2016-04-21 | |||
| JP2017164930A | 2017-09-21 | |||
| JP2014234353A | 2014-12-15 |
Attorney, Agent or Firm:
AOKI, Atsushi et al. (JP)
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