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Patent Searching and Data


Title:
QUANTUM DOT HYDROGEL, AND QUANTUM DOT PATTERNING AND TRANSFER PRINTING METHODS
Document Type and Number:
WIPO Patent Application WO/2019/227782
Kind Code:
A1
Abstract:
The invention relates to a quantum dot hydrogel, and quantum dot patterning and transfer printing methods. The quantum dot patterning method comprises: step 10, loading a quantum dot material in a high-temperature resistant hydrogel to form a quantum dot hydrogel; step 20, forming a quantum dot hydrogel thin film (2) on a metal substrate (1); and step 30, covering the surface of the quantum dot hydrogel thin film (2) with a patterning mold (3) and performing a nano-imprinting patterning process to obtain a patterned quantum dot hydrogel thin film. The invention further provides the quantum dot patterning and transfer printing methods. The quantum dot hydrogel and the hydrogel material used in the quantum dot patterning and transfer printing methods are cheap and have a high utilization rate and are thus suitable for industrial production; according to the quantum dot hydrogel structure, the quantum dot surface ligand coverage rate is maintained at the maximum extent, so that the fluorescence loss of quantum dots in the manufacturing process is reduced, and the fluorescence efficiency of an optical device can be improved when the quantum dot hydrogel structure is used for a quantum dot color filter.

Inventors:
ZHOU MIAO (CN)
LI DONGZE (CN)
Application Number:
PCT/CN2018/106339
Publication Date:
December 05, 2019
Filing Date:
September 18, 2018
Export Citation:
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Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G02F1/133; C08L33/26
Foreign References:
CN102016814A2011-04-13
CN101435991A2009-05-20
CN105504364A2016-04-20
CN105974654A2016-09-28
CN105278153A2016-01-27
US20030099887A12003-05-29
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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