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Patent Searching and Data


Title:
QUANTUM DOT PATTERNING METHOD, APPARATUS AND SYSTEM
Document Type and Number:
WIPO Patent Application WO/2021/196269
Kind Code:
A1
Abstract:
The present application provides a quantum dot patterning method, apparatus and system. A substrate is located between a plurality of upper electrodes and a plurality of lower electrodes, a quantum dot solution is coated on the substrate, and the upper electrodes and the lower electrodes are energized to form an electric field between the upper electrodes and the lower electrodes, so that the quantum dot solution is gathered between the upper electrodes and the lower electrodes according to electric field distribution. Subsequently, the quantum dot solution is deposited into a film by using a solvent evaporation method, and a patterned quantum dot thin film is obtained on the substrate.

Inventors:
ZHAO JINYANG (CN)
Application Number:
PCT/CN2020/084579
Publication Date:
October 07, 2021
Filing Date:
April 14, 2020
Export Citation:
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Assignee:
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
G02B5/20; B05C9/02; B05D1/00; G02B6/00
Domestic Patent References:
WO2016153461A12016-09-29
Foreign References:
CN102431964A2012-05-02
CN110711607A2020-01-21
CN110277425A2019-09-24
CN110780488A2020-02-11
CN109239829A2019-01-18
CN110611244A2019-12-24
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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