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Title:
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, ACID DIFFUSION CONTROL AGENT, CARBOXYLATE SALT AND CARBOXYLIC ACID
Document Type and Number:
WIPO Patent Application WO/2018/159560
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a radiation-sensitive resin composition which has excellent LWR performance, resolution, rectangularity of a cross-sectional shape, depth of focus and film shrinkage suppressing properties; a resist pattern forming method; an acid diffusion control agent; a carboxylate salt; and a carboxylic acid. The present invention is a radiation-sensitive resin composition which contains a polymer having an acid-cleavable group, a radiation-sensitive acid generator, a compound represented by formula (1) and a solvent. In formula (1), X represents an oxygen atom or a sulfur atom; R1 represents a hydrogen atom or a monovalent organic group having 1-20 carbon atoms; each of R2-R5 moieties independently represents a hydrogen atom or a monovalent organic group having 1-20 carbon atoms, or alternatively, two or more of the R2-R5 moieties combine with each other and represent an alicyclic structure having 3-20 ring members or an aliphatic heterocyclic structure together with carbon atoms to which the moieties are bonded; Zn+ represents an n-valent cation; and n represents an integer of 1-3.

Inventors:
NISHIKORI KATSUAKI (JP)
OKAZAKI SATOSHI (JP)
Application Number:
PCT/JP2018/007043
Publication Date:
September 07, 2018
Filing Date:
February 26, 2018
Export Citation:
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Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C07C59/11; C07C59/115; C07C59/13; C07C62/04; C07C62/06; G03F7/038; G03F7/039; G03F7/20; C07C381/12
Foreign References:
US20140242526A12014-08-28
US20130052585A12013-02-28
JP2015031760A2015-02-16
JP2014235248A2014-12-15
JP2015225251A2015-12-14
JP2017197489A2017-11-02
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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