Title:
RADIOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND
Document Type and Number:
WIPO Patent Application WO/2015/129832
Kind Code:
A1
Abstract:
The present invention is a radiosensitive resin composition containing: a polymer having a structural unit that contains the group represented by formula (1); and a radiosensitive acid generator. In formula (1), R1 is a substituted or unsubstituted divalent C1-10 hydrocarbon group. R2 is a single-bond or substituted or unsubstituted divalent chain C1-5 hydrocarbon group. R1 and one or more of R2 may be combined and, together with the carbon atoms bound thereto, form a 3-20 membered ring structure. a is an integer of 1-3. A is a monovalent group having two or more heteroatoms, and is bonded to R2 via a carbon atoms. The asterisk mark shows the binding site. A in formula (1) below is preferably a monovalent cyclic group having a heterocyclic structure.
Inventors:
NAMAI HAYATO (JP)
Application Number:
PCT/JP2015/055718
Publication Date:
September 03, 2015
Filing Date:
February 26, 2015
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/039; C07C233/91; C07C311/46; C07C311/48; C07D211/32; C07D211/96; C07D307/20; C07D309/10; C07D333/78; C07D335/02; C08F220/28; C08F220/34; C08F220/38; G03F7/038
Foreign References:
| JP2011059674A | 2011-03-24 | |||
| JP2001235861A | 2001-08-31 | |||
| JP2012215722A | 2012-11-08 | |||
| JP2014085642A | 2014-05-12 | |||
| JP2014136708A | 2014-07-28 |
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
Kazuki Amano (JP)
Download PDF:
Previous Patent: METHOD FOR PRODUCING TEREPHTHALIC ACID
Next Patent: POLYCONDENSATION RESIN AND OPTICAL FILM COMPRISING SAME
Next Patent: POLYCONDENSATION RESIN AND OPTICAL FILM COMPRISING SAME