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Title:
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, AND REFLECTIVE MASK MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/190360
Kind Code:
A1
Abstract:
A reflective mask blank has, in the following order, a substrate, a multilayer reflective film that reflects EUV light, a protective film that protects the multilayer reflective film, and an absorption shift film (13) that absorbs the EUV light. The protective film contains at least 50 at% of Rh. A strip-form grayscale image parallel to the interface between the protective film and the multilayer reflective film is acquired by capturing an image of a cross section of the protective film using a transmission electron microscope (TEM), and when a brightness profile of the grayscale image in the longitudinal direction of the grayscale image is created, the brightness profile has 50 or more peaks per 100 nm in the longitudinal direction of the grayscale image.

Inventors:
KATO TAKUMA (JP)
AKAGI DAIJIRO (JP)
OKATO TAKESHI (JP)
OISHI RYUSUKE (JP)
ONO YUSUKE (JP)
Application Number:
PCT/JP2023/012236
Publication Date:
October 05, 2023
Filing Date:
March 27, 2023
Export Citation:
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Assignee:
AGC INC (JP)
International Classes:
G03F1/24; G03F1/48; G03F1/80
Foreign References:
JP2012129520A2012-07-05
JP2021184108A2021-12-02
JP2015073013A2015-04-16
JP2006283053A2006-10-19
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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