Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
Document Type and Number:
WIPO Patent Application WO/2022/264832
Kind Code:
A1
Abstract:
The purpose of the present disclosure is to provide a reflective photomask capable of reducing a projection effect, and a method for manufacturing a reflective photomask. A reflective photomask (100) according to one aspect of the present disclosure is characterized by comprising: a substrate (11); a reflection layer (12) which has a multilayer film structure formed on the substrate (11) and reflects EUV light; a protection layer (13) which is formed on the reflection layer (12) and protects the reflection layer (12); and an absorption patterned layer (14a) which is formed on the protection layer (13), on which a pattern is formed, and which absorbs the EUV light, the absorption patterned layer (14a) comprising a material with an extinction coefficient k greater than 0.041 for the EUV light, and the magnitude θ of a sidewall angle formed by a sidewall of the absorption patterned layer (14a) and the substrate (11) being less than 90°.

Inventors:
MIYAWAKI DAISUKE (JP)
GODA AYUMI (JP)
NAKANO HIDEAKI (JP)
ICHIKAWA KENJIRO (JP)
YAMAGATA YUTO (JP)
Application Number:
PCT/JP2022/022523
Publication Date:
December 22, 2022
Filing Date:
June 02, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOPPAN PHOTOMASK CO LTD (JP)
International Classes:
G03F1/24
Foreign References:
JP2013532381A2013-08-15
JP2020034666A2020-03-05
JP2021085998A2021-06-03
JP2011166039A2011-08-25
JP2009147200A2009-07-02
JP2006148113A2006-06-08
Attorney, Agent or Firm:
HIROSE Hajime et al. (JP)
Download PDF: