Title:
REMOVABLE COVER FOR PROTECTING A RETICLE, SYSTEM INCLUDING AND METHOD OF USING THE SAME
Document Type and Number:
WIPO Patent Application WO2001027695
Kind Code:
A9
Abstract:
A removable cover for protecting a reticle used in a lithography system is described. The removable cover includes a frame and a membrane supported by the frame. The membrane is transparent to an inspection wavelength such that the reticle can be inspected with the removable cover in place. This removable cover protects the reticle when the removable cover is in place and is removable for lithographic exposure. The removable cover can further include at least one reticle fastener that applies force to the reticle thereby preventing movement of the removable cover relative to the reticle when the removable cover is in place. A plurality of fasteners are used to position and secure the removable cover and reticle. A method of performing lithography and a lithographic system are also described.
Inventors:
CATEY ERIC B
HULT DAVID
DEL PUERTO SANTIAGO
ROUX STEPHEN
HULT DAVID
DEL PUERTO SANTIAGO
ROUX STEPHEN
Application Number:
PCT/US2000/041056
Publication Date:
August 08, 2002
Filing Date:
October 04, 2000
Export Citation:
Assignee:
SILICON VALLEY GROUP (US)
International Classes:
G03F1/64; G03F1/66; G03F7/20; G03F1/62; H01L21/027; H01L21/673; (IPC1-7): G03F7/20; G03F1/14; H01L21/00
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