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Patent Searching and Data


Title:
RESIDUAL WATER DRAINING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/006481
Kind Code:
A1
Abstract:
The present invention relates to a residual water supply apparatus for a toilet water tank, and relates to a technique of allowing whether to open or close a residual water supply valve to be linked with a variation in a water level in the water tank. In detail, the apparatus comprises: a water tank (10) for storing water; a main discharge pipe (110) allowing the water tank to be in communication with a toilet bowl; a flushing valve (120) which selectively opens and closes the main discharge pipe; an overflow pipe (210) having a side which is in communication with the side surface of the main discharge pipe; a residual water supply pipe (310) having a side which is in communication with the side surface of the main discharge pipe; and a residual water valve opening/closing unit (400) formed on the opposite side of the residual water supply pipe.

Inventors:
SON JUNGWOO (KR)
Application Number:
PCT/KR2020/007058
Publication Date:
January 14, 2021
Filing Date:
June 01, 2020
Export Citation:
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Assignee:
SON JUNGWOO (KR)
International Classes:
E03D1/34
Foreign References:
KR101899043B12018-09-14
KR20020069688A2002-09-05
KR101218592B12013-01-04
JP2017014830A2017-01-19
JP3068297U2000-04-28
KR102035340B12019-10-22
Attorney, Agent or Firm:
HONG, Seokyoung (KR)
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