Title:
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT
Document Type and Number:
WIPO Patent Application WO/2023/048168
Kind Code:
A1
Abstract:
The present invention provides a resist composition which contains a base material component (A) and a compound (D0) that is represented by general formula (d0). In the formula, Rd0 represents a fused ring group wherein an aromatic ring and an alicyclic ring are fused with each other. The alicyclic ring in the fused ring group has substituents; and at least one of the substituents comprises a hydrocarbon group having a bromine atom or a hydrocarbon group having an iodine atom. Yd0 represents a divalent linking group or a single bond. Meanwhile, Yd0 is bonded to the alicyclic ring in the fused ring group. Mm+ represents an organic cation having a valency of m; and m is an integer that is greater than or equal to 1.
Inventors:
UEHARA TAKUYA (JP)
Application Number:
PCT/JP2022/035124
Publication Date:
March 30, 2023
Filing Date:
September 21, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/004; C07C69/616; C07C381/12; C07D333/76; C09K3/00; G03F7/039; G03F7/20
Domestic Patent References:
| WO2017179727A1 | 2017-10-19 |
Foreign References:
| JP2021081678A | 2021-05-27 | |||
| JP2019074592A | 2019-05-16 | |||
| JP2021091666A | 2021-06-17 | |||
| JP2021091645A | 2021-06-17 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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