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Patent Searching and Data


Title:
RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/1998/037458
Kind Code:
A1
Abstract:
A resist composition comprising (A) a high-molecular compound having at least one functional group which is decomposed by an acid to impart alkali solubility and containing no aromatic rings, (B) a compound which generates an acid upon irradiation with an actinic radiation, and (C) an amine having a molecular weight of 100 to 240 and a boiling point at 760 mmHg of 200 to 350 �C.

Inventors:
SONE ATSUSHI (JP)
TANAKA KIMIAKI (JP)
Application Number:
PCT/JP1998/000705
Publication Date:
August 27, 1998
Filing Date:
February 20, 1998
Export Citation:
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Assignee:
NIPPON ZEON CO (JP)
SONE ATSUSHI (JP)
TANAKA KIMIAKI (JP)
International Classes:
G03F7/004; G03F7/039; (IPC1-7): G03F7/039; C08L33/04; G03F7/004
Foreign References:
JPH05249662A1993-09-28
JPH05127369A1993-05-25
JPH0580515A1993-04-02
JPH05346668A1993-12-27
JPH07191463A1995-07-28
JPH07252324A1995-10-03
JPH08305023A1996-11-22
Attorney, Agent or Firm:
Nishikawa, Shigeaki (43-8 Higashi-Nippori 3-chom, Arakawa-ku Tokyo, JP)
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