Title:
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVING ALICYCLIC HYDROCARBON GROUP
Document Type and Number:
WIPO Patent Application WO/2022/163602
Kind Code:
A1
Abstract:
The present invention provides: a composition for forming a resist underlayer film that enables the formation of a desired resist pattern; a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. This composition for forming a resist underlayer film contains a polymer and a solvent, said polymer comprising a unit structure (A) represented by formula (1) [in formula (1): R1 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms; and L1 represents an optionally substituted aliphatic ring, an aryl group having 6-40 carbon atoms or a hetero ring] and a unit structure (B) that contains an aliphatic ring in a side chain and that is different from the unit structure (A).
Inventors:
SHIMIZU SHOU (JP)
TAMURA MAMORU (JP)
TAMURA MAMORU (JP)
Application Number:
PCT/JP2022/002501
Publication Date:
August 04, 2022
Filing Date:
January 25, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08F8/14; C08F220/16; C08F220/26; G03F7/004; G03F7/11; H01L21/027
Domestic Patent References:
| WO2007023710A1 | 2007-03-01 |
Foreign References:
| JP2011053652A | 2011-03-17 | |||
| JP2006509245A | 2006-03-16 | |||
| JP2007114245A | 2007-05-10 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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