Title:
RETROREFLECTION SHEET COMPRISING PATTERN FOR ENHANCEMENT OF RETROREFLECTION COEFFICIENT
Document Type and Number:
WIPO Patent Application WO/2021/054777
Kind Code:
A1
Abstract:
Disclosed is a retroreflection sheet comprising a pattern for enhancement of a retroreflection coefficient. A retroreflection sheet according to an embodiment of the present invention may comprise: a substrate layer including polymer resin; an optical path inducing layer which is in contact with the lower surface of the substrate layer and includes adhesive resin; and a pattern layer which is in contact with the lower surface of the optical path inducing layer and includes a corner cube pattern and an additional pattern formed on surfaces different from each other.
Inventors:
LEE JOON YONG (KR)
BAE CHAN YEOL (KR)
BAE CHAN YEOL (KR)
Application Number:
PCT/KR2020/012646
Publication Date:
March 25, 2021
Filing Date:
September 18, 2020
Export Citation:
Assignee:
MIRAENANOTECH CO LTD (KR)
International Classes:
G02B5/122
Foreign References:
KR100891901B1 | 2009-04-03 | |||
KR200243310Y1 | 2001-10-08 | |||
JP2006243618A | 2006-09-14 | |||
KR100674452B1 | 2007-02-01 | |||
US20040229014A1 | 2004-11-18 |
Attorney, Agent or Firm:
WOOIN PATENT & LAW FIRM (KR)
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