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Title:
SHIFT AND SATURATION SYNCHRONOUS PROCESSING METHOD AND APPLICATION THEREOF
Document Type and Number:
WIPO Patent Application WO/2022/078263
Kind Code:
A1
Abstract:
A shift and saturation synchronous processing method, comprising the following steps: generating a shift MASK, generating a selection signal of an overflow bit after a shift, marking a bit corresponding to a shift overflow as 1, and marking the other positions as 0; selecting, by using the selection signal, data to be shifted, and if a MASK of a certain bit in the selection signal is 1, selecting a corresponding result from said data, otherwise, outputting the highest bit of said data; and detecting all the obtained results and the highest bit of said data, wherein when the highest bit of said data is 0, all the obtained results are 0, or when the highest bit of said data is 1, all the obtained results are 1, and as such, there is no shift overflow, otherwise, there is a shift overflow. The method has clear logic and a simple sequence of steps, such that a shift and a saturation determination are synchronously performed, thereby improving the shift operation efficiency.

Inventors:
HUANG PENG (CN)
DING XIAOBING (CN)
ZHU SHAOHUA (CN)
FENG CHAOBIN (CN)
Application Number:
PCT/CN2021/122871
Publication Date:
April 21, 2022
Filing Date:
October 09, 2021
Export Citation:
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Assignee:
SHANGHAI CHIPON MICRO ELECTRONIC CO LTD (CN)
International Classes:
G06F5/01; G06F9/30
Foreign References:
CN112181354A2021-01-05
US6112291A2000-08-29
CN1828520A2006-09-06
US20140173255A12014-06-19
Attorney, Agent or Firm:
SHANGHAI WITS&WIN PATENT AGENCY OFFICE (CN)
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