Title:
SILICA-BASED PARTICLE DISPERSION AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/075654
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a silica-based particle dispersion which contains a silica-based particle group and with which a high polishing rate and high surface precision can be achieved with respect to a silica-based substrate or a NiP-plated substrate to be polished or the like. The problem is solved by a silica-based particle dispersion containing a silica-based particle group including irregularly-shaped silica-based particles and non-irregularly-shaped silica-based particles, wherein the irregularly-shaped silica-based particles each have a core having a plurality of small holes thereinside and a covering silica layer which covers the core, and the silica-based particle group satisfies [1]-[3]. [1] Having a weight-average particle size (D1) of 100-600 nm, and a particle size (D2) of 30-300 nm in terms of specific surface area. [2] An irregular-shape degree D (D=D1/D3) represented by the ratio of the weight-average particle size (D1) and a projected area-equivalent particle size (D3) being in the range of 1.1-5.0. [3] When waveform separation is performed on a volume-reference particle size distribution, a multi-peak distribution in which three or more separate peaks are detected being obtained.
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Inventors:
KOMATSU MICHIO (JP)
NAKAYAMA KAZUHIRO (JP)
TANAKA TETSUYA (JP)
TAWARAZAKO YUJI (JP)
MUKAI TATSUYA (JP)
MIWA YUKI (JP)
NAKAYAMA KAZUHIRO (JP)
TANAKA TETSUYA (JP)
TAWARAZAKO YUJI (JP)
MUKAI TATSUYA (JP)
MIWA YUKI (JP)
Application Number:
PCT/JP2019/039378
Publication Date:
April 16, 2020
Filing Date:
October 04, 2019
Export Citation:
Assignee:
JGC CATALYSTS & CHEMICALS LTD (JP)
International Classes:
C01B33/149; B24B37/00; C01B33/143; C01B33/193; C09G1/02; C09K3/14; H01L21/304
Foreign References:
JP2017197693A | 2017-11-02 | |||
JP2007137972A | 2007-06-07 | |||
JP2010024119A | 2010-02-04 | |||
JP2001089128A | 2001-04-03 |
Attorney, Agent or Firm:
MIGITA, Shunsuke et al. (JP)
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