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Title:
SILICA-BASED PARTICLE DISPERSION AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/075654
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a silica-based particle dispersion which contains a silica-based particle group and with which a high polishing rate and high surface precision can be achieved with respect to a silica-based substrate or a NiP-plated substrate to be polished or the like. The problem is solved by a silica-based particle dispersion containing a silica-based particle group including irregularly-shaped silica-based particles and non-irregularly-shaped silica-based particles, wherein the irregularly-shaped silica-based particles each have a core having a plurality of small holes thereinside and a covering silica layer which covers the core, and the silica-based particle group satisfies [1]-[3]. [1] Having a weight-average particle size (D1) of 100-600 nm, and a particle size (D2) of 30-300 nm in terms of specific surface area. [2] An irregular-shape degree D (D=D1/D3) represented by the ratio of the weight-average particle size (D1) and a projected area-equivalent particle size (D3) being in the range of 1.1-5.0. [3] When waveform separation is performed on a volume-reference particle size distribution, a multi-peak distribution in which three or more separate peaks are detected being obtained.

Inventors:
KOMATSU MICHIO (JP)
NAKAYAMA KAZUHIRO (JP)
TANAKA TETSUYA (JP)
TAWARAZAKO YUJI (JP)
MUKAI TATSUYA (JP)
MIWA YUKI (JP)
Application Number:
PCT/JP2019/039378
Publication Date:
April 16, 2020
Filing Date:
October 04, 2019
Export Citation:
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Assignee:
JGC CATALYSTS & CHEMICALS LTD (JP)
International Classes:
C01B33/149; B24B37/00; C01B33/143; C01B33/193; C09G1/02; C09K3/14; H01L21/304
Foreign References:
JP2017197693A2017-11-02
JP2007137972A2007-06-07
JP2010024119A2010-02-04
JP2001089128A2001-04-03
Attorney, Agent or Firm:
MIGITA, Shunsuke et al. (JP)
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