Title:
SILICON COMPOUND CONTAINING HEXAFLUOROISOPROPANOL GROUP, METHOD FOR PRODUCING SILICON COMPOUND, POLYSILOXANE, AND METHOD FOR PRODUCING POLYSILOXANE
Document Type and Number:
WIPO Patent Application WO/2022/168735
Kind Code:
A1
Abstract:
Provided are: a silicon compound (HFIP group-containing aromatic alkoxysilane) containing an HFIP group and containing a reduced amount of a specific halogenated silane compound; a method for producing the same; a polysiloxane obtained by polymerizing the silicon compound which contains the HFIP group; and a method for producing the same. Provided is a silicon compound containing a silicon compound represented by formula (1) and a halogenated silane compound represented by formula (2), wherein the content of the halogenated silane compound represented by formula (2) is greater than 0 ppm by mass and no greater than 1,000 ppm by mass.
Inventors:
KATAMURA TOMOHIRO (JP)
NAKATSUJI JUNYA (JP)
SUGITA YUTAKA (JP)
OIKAWA YURI (JP)
YAMANAKA KAZUHIRO (JP)
NAKATSUJI JUNYA (JP)
SUGITA YUTAKA (JP)
OIKAWA YURI (JP)
YAMANAKA KAZUHIRO (JP)
Application Number:
PCT/JP2022/003177
Publication Date:
August 11, 2022
Filing Date:
January 27, 2022
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
C07F7/18; C08G77/24
Domestic Patent References:
WO2020090746A1 | 2020-05-07 | |||
WO2019167770A1 | 2019-09-06 |
Foreign References:
JP2014156461A | 2014-08-28 | |||
JP2015129908A | 2015-07-16 |
Attorney, Agent or Firm:
TAKAHASHI, HAYASHI AND PARTNER PATENT ATTORNEYS, INC. (JP)
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