SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER

Title:

SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER

Document Type and Number:

WIPO Patent Application WO/2020/230828

Kind Code:

A1

Abstract:

The present invention aims to provide: a novel silicon-containing polymer that is alkali soluble or is soluble in an alkaline aqueous solution by using heat, etc.; a film-forming composition including the silicon-containing polymer; a method for forming a silicon-containing polymer coating using the film-forming composition; a method for forming a silica coating using the film-forming composition; and a production method for the silicon-containing polymer.　The silicon-containing polymer including at least either a polysiloxane chain or oligosiloxane chain or a polysilane chain or oligosilane chain in the molecular chain thereof has a group that has e.g., a carboxy or carboxylic acid ester group and a sulfide group, introduced to the molecular chain as a result of an ene-thiol reaction.

Inventors:

NODA KUNIHIRO (JP)
SESHIMO TAKEHIRO (JP)
SHIOTA DAI (JP)

Application Number:

PCT/JP2020/019147

Publication Date:

November 19, 2020

Filing Date:

May 13, 2020

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)

International Classes:

C08G77/60; C08G77/28; C09D183/08; C09D183/16

Domestic Patent References:

WO2016111210A1

2016-07-14

Foreign References:

EP2105454A1	2009-09-30
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JPH06287533A	1994-10-11
JP2017092433A	2017-05-25
JP2008508406A	2008-03-21
JPS55139390A	1980-10-31
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JP2015108087A	2015-06-11
JP6462876B2	2019-01-30

Other References: