Title:
SILYL ACRYLATE AND POSS COMPOSITIONS USED IN MICROLITHOGRAPHIC PROCESSES
Document Type and Number:
WIPO Patent Application WO2004076465
Kind Code:
A3
Abstract:
New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organosilicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include -OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.
Inventors:
MEADOR JIM D (US)
NAGATKINA MARIYA (US)
HOLMES DOUG (US)
NAGATKINA MARIYA (US)
HOLMES DOUG (US)
Application Number:
PCT/US2004/005753
Publication Date:
June 02, 2005
Filing Date:
February 24, 2004
Export Citation:
Assignee:
BREWER SCIENCE INC (US)
MEADOR JIM D (US)
NAGATKINA MARIYA (US)
HOLMES DOUG (US)
MEADOR JIM D (US)
NAGATKINA MARIYA (US)
HOLMES DOUG (US)
International Classes:
C08F230/08; C08G77/20; G03C1/76; C07F; (IPC1-7): C08F230/08; C08G77/20
Foreign References:
| US5484867A | 1996-01-16 | |||
| US6420084B1 | 2002-07-16 | |||
| US2956044A | 1960-10-11 | |||
| US4481049A | 1984-11-06 |
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