Title:
SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2021/153030
Kind Code:
A1
Abstract:
[Problem] To provide: a solid-state imaging device that can enhance the light blocking effect of a charge accumulation unit; and a method for manufacturing the same. [Solution] A solid-state imaging device according to the present disclosure is provided with: a substrate; a plurality of photoelectric conversion units provided on the substrate; a charge accumulation unit provided between four photoelectric conversion units that are mutually adjacent on the substrate; and a light-blocking film provided in a groove in the substrate. The groove includes: a first portion provided between two photoelectric conversion units that are mutually adjacent; and a second portion provided around the charge accumulation unit. The second portion has a first opening between the charge accumulation unit and at least a first photoelectric conversion unit of the four photoelectric conversion units and passes through the substrate between the charge accumulation unit and at least a second photoelectric conversion unit of the four photoelectric conversion units.
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Inventors:
TOKUMITSU CHIE (JP)
Application Number:
PCT/JP2020/046121
Publication Date:
August 05, 2021
Filing Date:
December 10, 2020
Export Citation:
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORP (JP)
International Classes:
H01L27/146; H04N5/359; H04N5/369
Domestic Patent References:
| WO2018083990A1 | 2018-05-11 | |||
| WO2018216477A1 | 2018-11-29 | |||
| WO2015001987A1 | 2015-01-08 | |||
| WO2018008614A1 | 2018-01-11 |
Foreign References:
| JP2017152921A | 2017-08-31 | |||
| JP2004128193A | 2004-04-22 | |||
| JP2014096490A | 2014-05-22 |
Attorney, Agent or Firm:
NAKAMURA Yukitaka et al. (JP)
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