Title:
SOLVENT COMPOSITION, CLEANING AGENT, CLEANING METHOD, COATING FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE HAVING COATING FILM, AND AEROSOL
Document Type and Number:
WIPO Patent Application WO/2023/027188
Kind Code:
A1
Abstract:
Provided are: a solvent composition that contains monochlorotrifluoropropene and a perfluoroolefin having a boiling point of 30-120°C at normal pressure; a cleaning agent that contains the solvent composition; a cleaning method in which the cleaning agent is used; a coating film-forming composition that contains the solvent composition; a method for producing a substrate having a coating film by using the coating film-forming composition; a solvent composition which has no adverse effect on the global environment when an aerosol containing the solvent composition is used, has little effect on resin materials, exhibits sufficient volatility and exhibits excellent solubility of oils and the like; and applications of these.
Inventors:
OSAFUNE KANAKO (JP)
KUMAMOTO KENTARO (JP)
KUMAMOTO KENTARO (JP)
Application Number:
PCT/JP2022/032298
Publication Date:
March 02, 2023
Filing Date:
August 26, 2022
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
C11D7/30; C09D7/63; C09K3/30; C11D7/50
Domestic Patent References:
| WO2019039521A1 | 2019-02-28 |
Foreign References:
| JP2019512061A | 2019-05-09 | |||
| JP2019206609A | 2019-12-05 | |||
| JP2022086487A | 2022-06-09 |
Attorney, Agent or Firm:
KOH-EI PATENT FIRM, P.C. (JP)
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