Title:
SPRAYING APPARATUS AND CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/094053
Kind Code:
A1
Abstract:
A spraying apparatus and a cleaning device. The spraying apparatus comprises an atomizing structure for atomizing the cleaning liquid during spraying to form droplets; and a gas spraying structure for spraying the gas in the designated direction so that the spraying gas can collide with the droplets to form atomizing particles. The spraying apparatus not only can improve the cleaning uniformity, the cleaning efficiency, and the cleaning process result, but also can reduce the impact of the droplets on the surface to be cleaned to a certain extent, thereby reducing the damage to a wafer surface pattern.
Inventors:
LIU WEI (CN)
LIU XIAOYAN (CN)
WU YI (CN)
LIU XIAOYAN (CN)
WU YI (CN)
Application Number:
PCT/CN2019/115971
Publication Date:
May 14, 2020
Filing Date:
November 06, 2019
Export Citation:
Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H01L21/67; B05B7/04; B08B3/02
Foreign References:
| CN105513999A | 2016-04-20 | |||
| CN105344511A | 2016-02-24 | |||
| CN105154614A | 2015-12-16 | |||
| CN101607237A | 2009-12-23 | |||
| CN103446691A | 2013-12-18 | |||
| CN104772242A | 2015-07-15 | |||
| US4343433A | 1982-08-10 | |||
| SU1801607A1 |
Other References:
See also references of EP 3879562A4
Attorney, Agent or Firm:
TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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