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Title:
SPUTTERING TARGET AND MAGNETIC RECORDING MEDIA
Document Type and Number:
WIPO Patent Application WO/2020/066826
Kind Code:
A1
Abstract:
This sputtering target has (100-x)MgO-xCuO(0

Inventors:
TANAKA MASAKI (JP)
MITANI ATSUYUKI (JP)
SHIMA TOSHIYUKI (JP)
Application Number:
PCT/JP2019/036727
Publication Date:
April 02, 2020
Filing Date:
September 19, 2019
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Assignee:
UBE MAT IND LTD (JP)
International Classes:
C23C14/34; C04B35/04; C23C14/08; G11B5/64; G11B5/738; G11B5/851; H01F10/14; H01F10/28
Domestic Patent References:
WO2017154741A12017-09-14
Foreign References:
JPH02116621A1990-05-01
CN103422064A2013-12-04
CN106711201A2017-05-24
US20040192560A12004-09-30
Attorney, Agent or Firm:
INOUE Hajime et al. (JP)
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